Professor (rtd.) for Semiconductors
Organisational unit: Research/Working group
Former unit
Active until. 30 Sept 2022.
Related content and researchers (public profile)
- Research output
- Journals
Design Enablement Flow for Circuits with Inherent Obfuscation based on Reconfigurable Transistors
Trommer, J., Bhattacharjee, N., Mikolajick, T., Huhn, S., Merten, M., Djeridane, M. E., Hassan, M., & 9 othersDrechsler, R., Rai, S., Kavand, N., Darjani, A., Kumar, A., Sessi, V., Drescher, M., Kolodinski, S. & Wiatr, M., 2023, 2023 Design, Automation and Test in Europe Conference and Exhibition, DATE 2023 - Proceedings. Institute of Electrical and Electronics Engineers Inc., (Design, Automation and Test in Europe Conference and Exhibition (DATE)).Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review
Combined proton radiography and irradiation for high-precision preclinical studies in small animals
Schneider, M., Bodenstein, E., Bock, J., Dietrich, A., Gantz, S., Heuchel, L., Krause, M., & 8 othersLühr, A., von Neubeck, C., Nexhipi, S., Schürer, M., Tillner, F., Beyreuther, E., Suckert, T. & Müller, J. R., 31 Aug 2022, In: Frontiers in oncology. 12, 982417.Research output: Contribution to journal › Research article › Contributed › peer-review
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
Reif, J., Knaut, M., Killge, S., Albert, M., Mikolajick, T. & Bartha, J. W., 1 May 2022, In: Journal of Vacuum Science & Technology A. 40, 3, 032602.Research output: Contribution to journal › Research article › Contributed › peer-review
Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination
Raffel, Y., Olivo, R., Lederer, M., Muller, F., Hoffmann, R., Ali, T., Mertens, K., & 7 othersPirro, L., Drescher, M., Beyer, S., Kampfe, T., Seidel, K., Eng, L. M. & Heitmann, J., 2022, 2022 IEEE International Memory Workshop (IMW). Dresden, (IEEE International Memory Workshop (IMW)).Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review
In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
Reif, J., Knaut, M., Killge, S., Winkler, F., Albert, M. & Bartha, J. W., Jan 2020, In: Journal of vacuum science & technology. A. Vacuum, surfaces, and films. 38, 1Research output: Contribution to journal › Research article › Contributed › peer-review
Frontiers in Oncology
ISSNs: 2234-943X
Frontiers Media S.A.
Scopus rating (2023): CiteScore 6.2 SJR 1.066 SNIP 0.831
Indexed in DOAJ
Journal
Journal of vacuum science & technology. A. Vacuum, surfaces, and films
ISSNs: 0734-2101
Additional searchable ISSN (electronic): 1520-8559
AVS Science and Technology Society, United States of America
Scopus rating (2023): CiteScore 5.1 SJR 0.569 SNIP 0.957
Journal