In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Details
Original language | English |
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Journal | Journal of vacuum science & technology. A. Vacuum, surfaces, and films |
Volume | 38 |
Issue number | 1 |
Publication status | Published - Jan 2020 |
Peer-reviewed | Yes |
External IDs
Scopus | 85077445776 |
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