Ferroelectricity in HfO 2 enables nonvolatile data storage in 28 nm HKMG

Research output: Contribution to book/conference proceedings/anthology/reportConference contributionContributedpeer-review

Contributors

Details

Original languageEnglish
Title of host publicationVLSI
Publication statusPublished - 2012
Peer-reviewedYes

External IDs

Scopus 84866536057

Keywords