Review and perspective on ferroelectric HfO <inf>2</inf> -based thin films for memory applications
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Details
| Original language | English |
|---|---|
| Pages (from-to) | 795–808 |
| Number of pages | 14 |
| Journal | MRS communications |
| Volume | 8 |
| Publication status | Published - 2018 |
| Peer-reviewed | Yes |
External IDs
| Scopus | 85052932053 |
|---|