Review and perspective on ferroelectric HfO <inf>2</inf> -based thin films for memory applications

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Details

Original languageEnglish
Pages (from-to)795–808
Number of pages14
JournalMRS communications
Volume8
Publication statusPublished - 2018
Peer-reviewedYes

External IDs

Scopus 85052932053