Review and perspective on ferroelectric HfO2-based thin films for memory applications

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • M.H. Park - , NaMLab - Nanoelectronic materials laboratory gGmbH, Pusan National University (Author)
  • Y.H. Lee - , Seoul National University (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • C.S. Hwang - , Seoul National University (Author)

Details

Original languageEnglish
Pages (from-to)795–808
Number of pages14
JournalMRS communications
Volume8
Publication statusPublished - 2018
Peer-reviewedYes

External IDs

Scopus 85052932053

Keywords

Library keywords