Optimizing process conditions for improved Hf1 − xZrxO2 ferroelectric capacitor performance

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • T. Mittmann - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • F.P.G. Fengler - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • C. Richter - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Min Hyuk Park - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Details

Original languageEnglish
Pages (from-to)48-51
Number of pages4
JournalMicroelectronic Engineering
Volume178
Publication statusPublished - 2017
Peer-reviewedYes

External IDs

Scopus 85018359703

Keywords

Library keywords