Multi-staged deposition of trench-gate oxides for power MOSFETs

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • Markus Neuber - , Infineon Technologies Dresden GmbH & Co. KG (Author)
  • Olaf Storbeck - , Infineon Technologies Dresden GmbH & Co. KG (Author)
  • Maik Langner - , Infineon Technologies Dresden GmbH & Co. KG (Author)
  • Knut Stahrenberg - , Infineon Technologies Dresden GmbH & Co. KG (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Details

Original languageEnglish
Article number032202
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume37
Publication statusPublished - May 2019
Peer-reviewedYes

External IDs

Scopus 85066156296

Keywords

Library keywords