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Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories

Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review

Contributors

J. Muller - (Author)
T.S. Boscke - (Author)
S. Muller - (Author)
E. Yurchuk - (Author)
P. Polakowski - , Chair of Opto-Electronic Components and Systems (Author)
J. Paul - (Author)
D. Martin - (Author)
T. Schenk - , Faculty of Electrical and Computer Engineering (Author)
K. Khullar - (Author)
A. Kersch - (Author)
W. Weinreich - (Author)
S. Riedel - (Author)
K. Seidel - (Author)
A. Kumar - (Author)
T.M. Arruda - (Author)
S.V. Kalinin - (Author)
T. Schlosser - (Author)
R. Boschke - (Author)
R. Van Bentum - (Author)
U. Schröder - (Author)
T. Mikolajick - , Chair of Nanoelectronics (Author)

Details

Original language	English
Title of host publication	IEDM
Publication status	Published - 2013
Peer-reviewed	Yes

External IDs

Scopus	84894297755

Keywords