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Area-selective atomic layer deposition of Ru on electron-beam-written Pt (C) patterns versus SiO2 substratum

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

Marcel Junige - , Institute of Semiconductors and Microsystems, Chair of Semiconductors (Author)
Markus Loeffler - , Dresden Center for Nanoanalysis (DCN) (Author)
Marion Geidel - , Faculty of Electrical and Computer Engineering (Author)
Matthias Albert - , Chair of Semiconductors (Author)
Johann W. Bartha - , Chair of Semiconductors (Author)
Ehrenfried Zschech - (Author)
Bernd Rellinghaus - , Dresden Center for Nanoanalysis (DCN) (Author)
Willem F. van Dorp - (Author)

Details

Original language	English
Journal	Nanotechnology
Volume	28
Issue number	39
Publication status	Published - 27 Sept 2017
Peer-reviewed	Yes

External IDs

Scopus	85029535743

Keywords