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Hybrid-Lithography for the Master of Multi-ModeWaveguides NIL Stamp

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Date

6 Jul 2023

Description

the presented work demonstrates the fabrication process of the master for nano-imprint lithography (NIL) stamp for multi-mode waveguide (MM-WG) with μ-mirror using hybrid-lithography, which includes a 2-photon-polymerization direct laser writing process (2PP-DLW) for μ-mirror surface and UV-photo lithography for MM-WGs. For the definition of the mirror surface at either end of waveguides in the master stamp, the 2PP-DLW process was used. It offers a lower surface roughness (< 0.1 λ) with fewer processing steps, alignment accuracy of ± 1 μm, prints fine and sharp contours, and relatively faster scanning for a specific material, which makes it the foremost technology over the traditional micro-mirror processes such as the dicing process, moving mask lithography, laser ablation, wet etching, and dry etching. For the fabrication of the waveguide core with rectangular cross-sections in the master stamp, UV mask exposure with SU-8 was used. It is a mass-production and low-cost technique. It gives a smooth structure with 90-degree sidewalls compared to other processes like dry etching, wet etching, mosquito method, and E-beam writing. We demonstrated the design and process of a master pattern with a density range from 0.04 to 0.2 to maintain equal pressure over the stamp in the NIL step for an almost uniform residual thickness layer.

Conference

Title46th International Spring Seminar on Electronics Technology, ISSE 2023
Duration10 - 14 May 2023
CityTimisoara
CountryRomania

Keywords

Subject groups, research areas, subject areas according to Destatis

Keywords

  • multi-mode waveguides (MM-WGs), micro-mirror, two-photon polymerization direct laser writing (2PP-DLW), UV lithography, hybrid-lithography