Hybrid-Lithography for the Master of Multi-ModeWaveguides NIL Stamp
Activity: Talk or presentation at external institutions/events › Talk/Presentation › Contributed
Persons and affiliations
- Akash Sunilkumar Mistry - , Institute of Electronic Packaging Technology, Chair of Electronic Packaging Technology (Speaker)
- Krzysztof Kamil Nieweglowski - , Chair of Electronic Packaging Technology (Involved person)
- Karlheinz Bock - , Chair of Electronic Packaging Technology (Involved person)
Date
6 Jul 2023
Description
the presented work demonstrates the fabrication process of the master for nano-imprint lithography (NIL) stamp for multi-mode waveguide (MM-WG) with μ-mirror using hybrid-lithography, which includes a 2-photon-polymerization direct laser writing process (2PP-DLW) for μ-mirror surface and UV-photo lithography for MM-WGs. For the definition of the mirror surface at either end of waveguides in the master stamp, the 2PP-DLW process was used. It offers a lower surface roughness (< 0.1 λ) with fewer processing steps, alignment accuracy of ± 1 μm, prints fine and sharp contours, and relatively faster scanning for a specific material, which makes it the foremost technology over the traditional micro-mirror processes such as the dicing process, moving mask lithography, laser ablation, wet etching, and dry etching. For the fabrication of the waveguide core with rectangular cross-sections in the master stamp, UV mask exposure with SU-8 was used. It is a mass-production and low-cost technique. It gives a smooth structure with 90-degree sidewalls compared to other processes like dry etching, wet etching, mosquito method, and E-beam writing. We demonstrated the design and process of a master pattern with a density range from 0.04 to 0.2 to maintain equal pressure over the stamp in the NIL step for an almost uniform residual thickness layer.Conference
Title | 2023 46th International Spring Seminar on Electronics Technology |
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Subtitle | Revolutionizing the Electronics Ecosystems - Chiplet and Heterogeneous Integration |
Abbreviated title | ISSE 2023 |
Conference number | 46 |
Duration | 10 - 14 May 2023 |
Website | |
Location | Politehnica University of Timisoara |
City | Timisoara |
Country | Romania |
Keywords
Subject groups, research areas, subject areas according to Destatis
Keywords
- multi-mode waveguides (MM-WGs), micro-mirror, two-photon polymerization direct laser writing (2PP-DLW), UV lithography, hybrid-lithography