Vergleichende untersuchungen zur anwendung von siliciumnitrid und tantalpentoxid als pH-sensitive schicht für ionensensitive feldeffekttransistoren
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Details
| Original language | German |
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| Pages (from-to) | 313-318 |
| Number of pages | 6 |
| Journal | VDI Berichte |
| Issue number | 1255 |
| Publication status | Published - 1996 |
| Peer-reviewed | Yes |
External IDs
| ORCID | /0000-0003-3814-0378/work/156338373 |
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