Structural Changes Underlying Field-Cycling Phenomena in Ferroelectric HfO2 Thin Films

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • E.D. Grimley - , North Carolina State University (Author)
  • T. Schenk - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • X. Sang - , North Carolina State University (Author)
  • M. Pešić - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • J.M. LeBeau - , North Carolina State University (Author)

Details

Original languageEnglish
Article number1600173
JournalAdvanced electronic materials
Volume2
Issue number9
Publication statusPublished - 2016
Peer-reviewedYes
Externally publishedYes

External IDs

Scopus 84979561703

Keywords

Library keywords