SrTiO3 on piezoelectric PMN-PT(001) for application of variable strain

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • O. Bilani-Zeneli - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • A. D. Rata - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • A. Herklotz - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • O. Mieth - , TUD Dresden University of Technology (Author)
  • L. M. Eng - , Chair of Experimental Physics / Photophysics (Author)
  • L. Schultz - , Chair of Metallic Materials and Metal Physics, Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • M. D. Biegalski - , Oak Ridge National Laboratory (Author)
  • H. M. Christen - , Oak Ridge National Laboratory (Author)
  • K. Dörr - , Leibniz Institute for Solid State and Materials Research Dresden (Author)

Abstract

SrTiO3 (STO) is the most frequently used substrate material for complex oxide films. In this work, STO is explored as a buffer layer on piezoelectric pseudocubic Pb (Mg1/3Nb2/3) 0.72Ti0.28O3 (001) (PMN-PT) substrates, which serve to reversibly strain thin films. The STO buffer layer reduces the in-plane lattice parameter and allows for a better lattice matching to a broader range of thin film materials. STO films (30 nm) have been grown with epitaxial orientation on PMN-PT with an in-plane lattice parameter close to that of bulk STO. The substrate's rhombohedral domain structure has been imaged by atomic force microscopy. The related ferroelectric domain structure has been investigated by piezoresponse force microscopy. Within a domain, STO grows with a rather low roughness (rms<0.2 nm). The transfer of the piezoelectric substrate strain to the STO film and its variation with an applied electric field are studied using x-ray diffraction. The strain dependence of the electrical resistance is measured for a ferromagnetic manganite film grown on top of the STO. Both experiments confirm qualitatively that the STO buffer transfers the substrate strain into a functional film deposited on top.

Details

Original languageEnglish
Article number054108
JournalJournal of applied physics
Volume104
Issue number5
Publication statusPublished - 2008
Peer-reviewedYes

External IDs

ORCID /0000-0002-2484-4158/work/175744105

Keywords

ASJC Scopus subject areas