MOCVD of TiO₂ thin films using a heteroleptic titanium complex: Precursor evaluation and investigation of optical, photoelectrochemical and electrical properties

Banerjee, M., Dang, V. S., Bledowski, M., Beranek, R., Becker, H. W., Rogalla, D., Edengeiser, E., & 3 othersHavenith, M., Wieck, A. D. & Devi, A., 1 Sept 2014, In: Chemical Vapor Deposition. 20, 7-9, p. 224-233 10 p.

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Nanostructured Er₂O₃ thin films grown by metalorganic chemical vapour deposition

Xu, K., Dang, V. S., Ney, A., De Los Arcos, T. & Devi, A., Jul 2014, In: Journal of nanoscience and nanotechnology. 14, 7, p. 5095-5102 8 p.

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F-doped Co₃O₄ photocatalysts for sustainable H₂ generation from water/ethanol

Gasparotto, A., Barreca, D., Bekermann, D., Devi, A., Fischer, R. A., Fornasiero, P., Gombac, V., & 5 othersLebedev, O. I., MacCato, C., Montini, T., Van Tendeloo, G. & Tondello, E., 7 Dec 2011, In: Journal of the American Chemical Society. 133, 48, p. 19362-19365 4 p.

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Growth and crystallization of TiO₂ thin films by atomic layer deposition using a novel amido guanidinate titanium source and tetrakis-dimethylamido-titanium

Reiners, M., Xu, K., Aslam, N., Devi, A., Waser, R. & Hoffmann-Eifert, S., 13 Aug 2013, In: Chemistry of materials. 25, 15, p. 2934-2943 10 p.

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Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(N^tBu)₂{(ⁱPrN)₂CMe}₂] (M=Mo, W) as precursors

Srinivasan, N. B., Thiede, T. B., de los Arcos, T., Gwildies, V., Krasnopolski, M., Becker, H. W., Rogalla, D., & 2 othersDevi, A. & Fischer, R. A., 15 Sept 2013, In: Surface and Coatings Technology. 230, p. 130-136 7 p.

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Atomic layer deposition of Er₂O₃ thin films from Er tris-guanidinate and water: Process optimization, film analysis and electrical properties

Xu, K., Chaudhuri, A. R., Parala, H., Schwendt, D., Arcos, T. D. L., Osten, H. J. & Devi, A., 7 Jul 2013, In: Journal of Materials Chemistry C. 1, 25, p. 3939-3946 8 p.

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Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metal-organic chemical vapour deposition

Wree, J. L., Glauber, J. P., Öhl, D., Niesen, A., Kostka, A., Rogalla, D., Schuhmann, W., & 1 othersDevi, A., 28 Aug 2021, In: Journal of Materials Chemistry C. 9, 32, p. 10254-10265 12 p.

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Cobalt Metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity co thin films

Zanders, D., Liu, J., Obenlüneschloß, J., Bock, C., Rogalla, D., Mai, L., Nolan, M., & 2 othersBarry, S. T. & Devi, A., 13 Jul 2021, In: Chemistry of materials. 33, 13, p. 5045-5057 13 p.

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A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

Boysen, N., Misimi, B., Muriqi, A., Wree, J. L., Hasselmann, T., Rogalla, D., Haeger, T., & 4 othersTheirich, D., Nolan, M., Riedl, T. & Devi, A., 18 Nov 2020, In: Chemical communications. 56, 89, p. 13752-13755 4 p.

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A Rare Low-Spin Co^IV Bis(β-silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration

Zanders, D., Bačić, G., Leckie, D., Odegbesan, O., Rawson, J., Masuda, J. D., Devi, A., & 1 othersBarry, S. T., 10 Aug 2020, In: Angewandte Chemie - International Edition. 59, 33, p. 14138-14142 5 p.

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