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Research Portal of the TU Dresden

Advanced materials interfaces

ISSNs: 1521-3862, 0948-1907, 2196-7350

Additional searchable ISSN (electronic): 2196-7350

Wiley-VCH, Weinheim [u. a.]

Scopus rating (2023): CiteScore 8.4 SJR 1.194 SNIP 0.835

Indexed in DOAJ

Journal

Titles	Advanced materials interfaces(2014 → …) Chemical vapor deposition : CVD(1995 → 2015) Advanced Materials Interfaces Advanced materials interfaces Chemical Vapor Deposition
Additional searchable titles	Advanced materials and interfaces, Chemical vapor deposition : CVD, Chem. Vap. Deposition
ISSNs	1521-3862, 0948-1907, 2196-7350
Additional searchable ISSN (electronic)	2196-7350
Publisher	Wiley-VCH, Weinheim [u. a.]
ZDB-ID	2750376-8

Keywords

ASJC Scopus subject areas

Mechanics of Materials
Mechanical Engineering

Library keywords

Related content

Research output

Targeted Microforming of Borosilicate Glass Induced by a Laser-Ablation-Free Process Using Femtosecond Pulses

Skiba, M., Resche, S., Seiler, M., Lasagni, A. F. & Bliedtner, J., 2 Sept 2024, In: Advanced materials interfaces. 11 p.

Research output: Contribution to journal › Research article › Contributed › peer-review

Insights Into Curie-Temperature and Phase Formation of Ferroelectric Hf_1−xZr_xO₂ with Oxygen Defects from a Leveled Energy Landscape

Azevedo Antunes, L., Ganser, R., Schroeder, U., Mikolajick, T. & Kersch, A., 16 Jan 2024, In: Advanced materials interfaces. 11, 2, 2300710.

Research output: Contribution to journal › Research article › Contributed › peer-review

In Situ Nanoindentation at Elevated Humidities

Tadayon, K., Bar-On, B., Günther, B., Vogel, C. & Zlotnikov, I., 23 Nov 2023, In: Advanced materials interfaces. 10, 33, 2300459.

Research output: Contribution to journal › Research article › Contributed › peer-review

Modulation Doping of Silicon Nanowires to Tune the Contact Properties of Nano-Scale Schottky Barriers

Nagarajan, S., Hiller, D., Ratschinski, I., König, D., Smith, S. C., Mikolajick, T. & Trommer, J., 31 Oct 2023, In: Advanced materials interfaces. 11(2024), 1, 8 p., 2300600.

Research output: Contribution to journal › Research article › Contributed › peer-review

Interplay of Precursor and Plasma for The Deposition of HfO₂ via PEALD: Film Growth and Dielectric Properties

Preischel, F., Zanders, D., Berning, T., Kostka, A., Rogalla, D., Bock, C. & Devi, A., 4 Oct 2023, In: Advanced materials interfaces. 10, 28, 2300244.

Research output: Contribution to journal › Research article › Contributed › peer-review

View all research output (46)