Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • E. Erben - (Author)
  • Johannes Heitmann - (Author)
  • G. Jegert - (Author)
  • M. Kerber - (Author)
  • S. Knebel - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - (Author)
  • W. Weinreich - (Author)
  • J. Xu - , Fraunhofer Institute for Photonic Microsystems (Author)
  • D. Y. Zhou - (Author)

Details

Original languageEnglish
Article number124104
JournalJournal of applied physics
Volume108
Publication statusPublished - 2010
Peer-reviewedYes

External IDs

Scopus 78650906750

Keywords

Library keywords