Reduced leakage current in BiFeO3 thin films with rectifying contacts

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Yao Shuai - , Helmholtz-Zentrum Dresden-Rossendorf (Author)
  • Shengqiang Zhou - , Helmholtz-Zentrum Dresden-Rossendorf, Peking University (Author)
  • Stephan Streit - , Helmholtz-Zentrum Dresden-Rossendorf (Author)
  • Helfried Reuther - , Helmholtz-Zentrum Dresden-Rossendorf (Author)
  • Danilo Bürger - , Helmholtz-Zentrum Dresden-Rossendorf (Author)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Thomas Mikolajick - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Manfred Helm - , Chair of Semiconductor Spectroscopy, Helmholtz-Zentrum Dresden-Rossendorf (Author)
  • Heidemarie Schmidt - , Helmholtz-Zentrum Dresden-Rossendorf (Author)

Abstract

BiFeO3 thin films were grown on Pt/c-sapphire substrates by pulsed laser deposition with different growth rates. With increasing growth rate the leakage current is decreased and the conduction mechanism changes from bulk-limited Poole-Frenkel emission to interface-limited Schottky emission. In the present letter, we show that only the growth rate of the BiFeOv3 films close to the metal contacts has to be increased in order to reduce the leakage current and to observe saturated polarization-electric field hysteresis loops.

Details

Original languageEnglish
Article number232901
JournalApplied physics letters
Volume98
Issue number23
Publication statusPublished - 6 Jun 2011
Peer-reviewedYes

External IDs

ORCID /0000-0003-3814-0378/work/155840912

Keywords

ASJC Scopus subject areas