Reduced leakage current in BiFeO3 thin films with rectifying contacts

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Yao Shuai - , Helmholtz-Zentrum Dresden-Rossendorf (Autor:in)
  • Shengqiang Zhou - , Helmholtz-Zentrum Dresden-Rossendorf, Peking University (Autor:in)
  • Stephan Streit - , Helmholtz-Zentrum Dresden-Rossendorf (Autor:in)
  • Helfried Reuther - , Helmholtz-Zentrum Dresden-Rossendorf (Autor:in)
  • Danilo Bürger - , Helmholtz-Zentrum Dresden-Rossendorf (Autor:in)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Thomas Mikolajick - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Manfred Helm - , Professur für Spektroskopie in der Halbleiterphysik (gB/HZDR), Helmholtz-Zentrum Dresden-Rossendorf (Autor:in)
  • Heidemarie Schmidt - , Helmholtz-Zentrum Dresden-Rossendorf (Autor:in)

Abstract

BiFeO3 thin films were grown on Pt/c-sapphire substrates by pulsed laser deposition with different growth rates. With increasing growth rate the leakage current is decreased and the conduction mechanism changes from bulk-limited Poole-Frenkel emission to interface-limited Schottky emission. In the present letter, we show that only the growth rate of the BiFeOv3 films close to the metal contacts has to be increased in order to reduce the leakage current and to observe saturated polarization-electric field hysteresis loops.

Details

OriginalspracheEnglisch
Aufsatznummer232901
FachzeitschriftApplied physics letters
Jahrgang98
Ausgabenummer23
PublikationsstatusVeröffentlicht - 6 Juni 2011
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/155840912

Schlagworte

ASJC Scopus Sachgebiete