Readout Current in HZO-Based Bilayer FTJs: Physical Mechanisms and Design Insight

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • M. Segatto - , University of Udine (Author)
  • F. M. Puglisi - , University of Modena and Reggio Emilia (Author)
  • F. Driussi - , University of Udine (Author)
  • D. Lizzit - , University of Udine (Author)
  • L. Carpentieri - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • S. Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • D. Esseni - , University of Udine (Author)

Abstract

This article establishes a novel interpretation of the readout current in ferroelectric tunnel junctions (FTJs), which we found to be rate-limited by trap-to-trap tunneling (T2T) in the ferroelectric (FE) layer. We show that, with a single set of material parameters, we can reproduce both transient P-V and quasi-static readout experiments for two variants of HZO-based FTJs featuring different tunneling dielectrics. Our investigation puts the simulation of the readout current of FTJs on a much sounder physical basis, which allowed us to then explore a few possible design options to obtain an increase in the readout currents and to improve the ratio between the on and the off currents. Our results suggest that the readout currents can be improved mainly by increasing the bulk trap density in the FE layer.

Details

Original languageEnglish
Pages (from-to)2723-2729
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume73
Issue number5
Early online date16 Mar 2026
Publication statusPublished - 1 May 2026
Peer-reviewedYes

External IDs

ORCID /0000-0003-3814-0378/work/211721442

Keywords

Keywords

  • Ferroelectric devices, ferroelectric materials, memristors, tunneling