Readout Current in HZO-Based Bilayer FTJs: Physical Mechanisms and Design Insight

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • M. Segatto - , Università degli Studi di Udine (Autor:in)
  • F. M. Puglisi - , University of Modena and Reggio Emilia (Autor:in)
  • F. Driussi - , Università degli Studi di Udine (Autor:in)
  • D. Lizzit - , Università degli Studi di Udine (Autor:in)
  • L. Carpentieri - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • S. Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • D. Esseni - , Università degli Studi di Udine (Autor:in)

Abstract

This article establishes a novel interpretation of the readout current in ferroelectric tunnel junctions (FTJs), which we found to be rate-limited by trap-to-trap tunneling (T2T) in the ferroelectric (FE) layer. We show that, with a single set of material parameters, we can reproduce both transient P-V and quasi-static readout experiments for two variants of HZO-based FTJs featuring different tunneling dielectrics. Our investigation puts the simulation of the readout current of FTJs on a much sounder physical basis, which allowed us to then explore a few possible design options to obtain an increase in the readout currents and to improve the ratio between the on and the off currents. Our results suggest that the readout currents can be improved mainly by increasing the bulk trap density in the FE layer.

Details

OriginalspracheEnglisch
FachzeitschriftIEEE Transactions on Electron Devices
PublikationsstatusElektronische Veröffentlichung vor Drucklegung - 16 März 2026
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/211721442

Schlagworte

Schlagwörter

  • Ferroelectric devices, ferroelectric materials, memristors, tunneling