Polarization Switching and Charge Trapping in HfO2-Based Ferroelectric Transistors
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Abstract
In this study, we provide an insight into the polarization switching behavior of HfO2-based ferroelectric field-effect transistors (FeFETs) by utilizing the Landau-Ginzburg-Devonshire model in the multiscale physics-based modeling platform GinestraTM. Simulation results showed that a sufficient trap density is needed for complete polarization reversal. After that, we characterize the charge-Trapping behavior with a dedicated experiment. The test results are then compared with the simulation results under the same test condition. The charge trapping behavior is more sensitive to applied voltage amplitude than to the pulse width. From the simulation, we could also see that the potential difference between the applied gate voltage and the channel potential at the onset of strong inversion remains constant for all gate voltages.
Details
Original language | English |
---|---|
Pages (from-to) | 1903-1906 |
Number of pages | 4 |
Journal | IEEE electron device letters |
Volume | 44 |
Issue number | 11 |
Publication status | E-pub ahead of print - 24 Oct 2023 |
Peer-reviewed | Yes |
External IDs
ORCID | /0000-0003-3814-0378/work/150330863 |
---|
Keywords
ASJC Scopus subject areas
Keywords
- Charge trapping, ferroelectric field-effect transistors (FeFET), ferroelectric hafnium oxide (HfOâA'A'), multiscale physics-based modeling, polarization switching