Polarization Switching and Charge Trapping in HfO2-Based Ferroelectric Transistors

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Haidi Zhou - , Ferroelectric Memory GmbH (Author)
  • Johannes Ocker - , Ferroelectric Memory GmbH (Author)
  • Stefan Muller - , Ferroelectric Memory GmbH (Author)
  • Milan Pesic - , Applied Materials Incorporated (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH, TUD Dresden University of Technology (Author)

Abstract

In this study, we provide an insight into the polarization switching behavior of HfO2-based ferroelectric field-effect transistors (FeFETs) by utilizing the Landau-Ginzburg-Devonshire model in the multiscale physics-based modeling platform GinestraTM. Simulation results showed that a sufficient trap density is needed for complete polarization reversal. After that, we characterize the charge-Trapping behavior with a dedicated experiment. The test results are then compared with the simulation results under the same test condition. The charge trapping behavior is more sensitive to applied voltage amplitude than to the pulse width. From the simulation, we could also see that the potential difference between the applied gate voltage and the channel potential at the onset of strong inversion remains constant for all gate voltages.

Details

Original languageEnglish
Pages (from-to)1903-1906
Number of pages4
JournalIEEE electron device letters
Volume44
Issue number11
Publication statusPublished - 1 Nov 2023
Peer-reviewedYes

External IDs

ORCID /0000-0003-3814-0378/work/150330863

Keywords

Keywords

  • Charge trapping, ferroelectric field-effect transistors (FeFET), ferroelectric hafnium oxide (HfOâA'A'), multiscale physics-based modeling, polarization switching