Polarization Switching and Charge Trapping in HfO2-Based Ferroelectric Transistors

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Haidi Zhou - , Ferroelectric Memory Company (Autor:in)
  • Johannes Ocker - , Ferroelectric Memory Company (Autor:in)
  • Stefan Muller - , Ferroelectric Memory Company (Autor:in)
  • Milan Pesic - , Applied Materials Incorporated (Autor:in)
  • Thomas Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH, Technische Universität Dresden (Autor:in)

Abstract

In this study, we provide an insight into the polarization switching behavior of HfO2-based ferroelectric field-effect transistors (FeFETs) by utilizing the Landau-Ginzburg-Devonshire model in the multiscale physics-based modeling platform GinestraTM. Simulation results showed that a sufficient trap density is needed for complete polarization reversal. After that, we characterize the charge-Trapping behavior with a dedicated experiment. The test results are then compared with the simulation results under the same test condition. The charge trapping behavior is more sensitive to applied voltage amplitude than to the pulse width. From the simulation, we could also see that the potential difference between the applied gate voltage and the channel potential at the onset of strong inversion remains constant for all gate voltages.

Details

OriginalspracheEnglisch
Seiten (von - bis)1903-1906
Seitenumfang4
FachzeitschriftIEEE electron device letters
Jahrgang44
Ausgabenummer11
PublikationsstatusElektronische Veröffentlichung vor Drucklegung - 24 Okt. 2023
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/150330863

Schlagworte

Schlagwörter

  • Charge trapping, ferroelectric field-effect transistors (FeFET), ferroelectric hafnium oxide (HfOâA'A'), multiscale physics-based modeling, polarization switching