Photolabile carboxylic acid protected terpolymers for surface patterning. Part 2: Photocleavage and film patterning

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • M. Millaruelo - (Author)
  • L. M. Eng - , Institute of Applied Physics (Author)
  • M. Mertig - , Max Bergmann Center of Biomaterials Dresden (Author)
  • B. Pilch - (Author)
  • U. Oertel - (Author)
  • J. Opitz - (Author)
  • B. Sieczkowska - (Author)
  • F. Simon - (Author)
  • B. Voit - , Leibniz Institute of Polymer Research Dresden (Author)

Abstract

The surface properties of films made of p-methoxyphenacyl derivative terpolymers, associated with photocleavage by UV irradiation, and their optical patterning are investigated. The deprotection reaction has been monitored by UV and FTIR spectroscopy, contact angle measurements, and X-ray photoelectron spectroscopy, revealing the photoremoval of the protecting p-methoxyphenacyl group in high yields under mild conditions. Parallel and serial patterning of the films has been performed by selective irradiation through optical masks and by laser irradiation via fiber tips of a scanning near-field optical microscope, respectively. By irradiation of photolabile protected functional groups, free carboxylic groups become exposed to the surface with which fluorescent dyes and proteins can be associated specifically.

Details

Original languageEnglish
Pages (from-to)9446-9452
Number of pages7
JournalLangmuir
Volume22
Issue number22
Publication statusPublished - 24 Oct 2006
Peer-reviewedYes

External IDs

PubMed 17042567
Scopus 33751427259
ORCID /0000-0002-2484-4158/work/142257606
ORCID /0000-0002-4531-691X/work/148607736

Keywords

Keywords

  • Photochemical properties, Functionalized surfaces, Phenacyl ester, Attachment, Polymers