Photolabile carboxylic acid protected terpolymers for surface patterning. Part 2: Photocleavage and film patterning

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • M. Millaruelo - (Autor:in)
  • L. M. Eng - , Institut für Angewandte Physik (IAP) (Autor:in)
  • M. Mertig - , Max Bergmann Zentrum für Biomaterialien Dresden (MBZ) (Autor:in)
  • B. Pilch - (Autor:in)
  • U. Oertel - (Autor:in)
  • J. Opitz - (Autor:in)
  • B. Sieczkowska - (Autor:in)
  • F. Simon - (Autor:in)
  • B. Voit - , Leibniz-Institut für Polymerforschung Dresden (Autor:in)

Abstract

The surface properties of films made of p-methoxyphenacyl derivative terpolymers, associated with photocleavage by UV irradiation, and their optical patterning are investigated. The deprotection reaction has been monitored by UV and FTIR spectroscopy, contact angle measurements, and X-ray photoelectron spectroscopy, revealing the photoremoval of the protecting p-methoxyphenacyl group in high yields under mild conditions. Parallel and serial patterning of the films has been performed by selective irradiation through optical masks and by laser irradiation via fiber tips of a scanning near-field optical microscope, respectively. By irradiation of photolabile protected functional groups, free carboxylic groups become exposed to the surface with which fluorescent dyes and proteins can be associated specifically.

Details

OriginalspracheEnglisch
Seiten (von - bis)9446-9452
Seitenumfang7
FachzeitschriftLangmuir
Jahrgang22
Ausgabenummer22
PublikationsstatusVeröffentlicht - 24 Okt. 2006
Peer-Review-StatusJa

Externe IDs

PubMed 17042567
Scopus 33751427259
ORCID /0000-0002-2484-4158/work/142257606
ORCID /0000-0002-4531-691X/work/148607736

Schlagworte

Schlagwörter

  • Photochemical properties, Functionalized surfaces, Phenacyl ester, Attachment, Polymers