OFF-state induced threshold voltage relaxation after PBTI stress

Research output: Contribution to book/Conference proceedings/Anthology/ReportConference contributionContributedpeer-review

Contributors

  • S. Kupke - , TUD Dresden University of Technology (Author)
  • S. Knebel - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • G. Roll - , TUD Dresden University of Technology (Author)
  • S. Slesazeck - , TUD Dresden University of Technology (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • G. Krause - , Global Foundries, Inc. (Author)
  • G. Kurz - , Global Foundries, Inc. (Author)

Abstract

The influence of different relaxation biases on positive bias temperature instability (PBTI) recovery is investigated. The threshold voltage (V th) relaxation after stress is found to be accelerated by OFF-state bias in comparison to zero volt recovery. 2D device simulations evidence an increase in the drain side channel potential as well as an increase in the minimum potential for short channel devices. The relaxation effect is attributed to an enhanced detrapping of charge carriers by the drain-gate electrical field and becomes significant for short channel device below 0.1 μm length.

Details

Original languageEnglish
Title of host publication2012 IEEE International Integrated Reliability Workshop (IIRW)
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages95-98
Number of pages4
ISBN (electronic)978-1-4673-2752-7, 978-1-4673-2751-0
ISBN (print)9781467327527
Publication statusPublished - 2012
Peer-reviewedYes

Publication series

SeriesIEEE International Integrated Reliability Workshop (IIRW)
ISSN1930-8841

Workshop

Title2012 IEEE International Integrated Reliability Workshop
Abbreviated titleIIRW 2012
Duration14 - 18 October 2012
LocationStanford Sierra Conference Center
CitySouth Lake Tahoe
CountryUnited States of America

External IDs

ORCID /0000-0003-3814-0378/work/142256324