OFF-state induced threshold voltage relaxation after PBTI stress
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Beitragende
Abstract
The influence of different relaxation biases on positive bias temperature instability (PBTI) recovery is investigated. The threshold voltage (V th) relaxation after stress is found to be accelerated by OFF-state bias in comparison to zero volt recovery. 2D device simulations evidence an increase in the drain side channel potential as well as an increase in the minimum potential for short channel devices. The relaxation effect is attributed to an enhanced detrapping of charge carriers by the drain-gate electrical field and becomes significant for short channel device below 0.1 μm length.
Details
| Originalsprache | Englisch |
|---|---|
| Titel | 2012 IEEE International Integrated Reliability Workshop (IIRW) |
| Herausgeber (Verlag) | Institute of Electrical and Electronics Engineers (IEEE) |
| Seiten | 95-98 |
| Seitenumfang | 4 |
| ISBN (elektronisch) | 978-1-4673-2752-7, 978-1-4673-2751-0 |
| ISBN (Print) | 9781467327527 |
| Publikationsstatus | Veröffentlicht - 2012 |
| Peer-Review-Status | Ja |
Publikationsreihe
| Reihe | IEEE International Integrated Reliability Workshop (IIRW) |
|---|---|
| ISSN | 1930-8841 |
Workshop
| Titel | 2012 IEEE International Integrated Reliability Workshop |
|---|---|
| Kurztitel | IIRW 2012 |
| Dauer | 14 - 18 Oktober 2012 |
| Ort | Stanford Sierra Conference Center |
| Stadt | South Lake Tahoe |
| Land | USA/Vereinigte Staaten |
Externe IDs
| ORCID | /0000-0003-3814-0378/work/142256324 |
|---|