OFF-state induced threshold voltage relaxation after PBTI stress

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • S. Kupke - , Technische Universität Dresden (Autor:in)
  • S. Knebel - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • G. Roll - , Technische Universität Dresden (Autor:in)
  • S. Slesazeck - , Technische Universität Dresden (Autor:in)
  • T. Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • G. Krause - , Global Foundries, Inc. (Autor:in)
  • G. Kurz - , Global Foundries, Inc. (Autor:in)

Abstract

The influence of different relaxation biases on positive bias temperature instability (PBTI) recovery is investigated. The threshold voltage (V th) relaxation after stress is found to be accelerated by OFF-state bias in comparison to zero volt recovery. 2D device simulations evidence an increase in the drain side channel potential as well as an increase in the minimum potential for short channel devices. The relaxation effect is attributed to an enhanced detrapping of charge carriers by the drain-gate electrical field and becomes significant for short channel device below 0.1 μm length.

Details

OriginalspracheEnglisch
Titel2012 IEEE International Integrated Reliability Workshop (IIRW)
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers (IEEE)
Seiten95-98
Seitenumfang4
ISBN (elektronisch)978-1-4673-2752-7, 978-1-4673-2751-0
ISBN (Print)9781467327527
PublikationsstatusVeröffentlicht - 2012
Peer-Review-StatusJa

Publikationsreihe

ReiheIEEE International Integrated Reliability Workshop (IIRW)
ISSN1930-8841

Workshop

Titel2012 IEEE International Integrated Reliability Workshop
KurztitelIIRW 2012
Dauer14 - 18 Oktober 2012
OrtStanford Sierra Conference Center
StadtSouth Lake Tahoe
LandUSA/Vereinigte Staaten

Externe IDs

ORCID /0000-0003-3814-0378/work/142256324