Next-generation ferroelectric memories based on FE-HfO2

Research output: Contribution to book/Conference proceedings/Anthology/ReportConference contributionContributedpeer-review

Contributors

  • S. Mueller - , NaMLab - Nanoelectronic materials laboratory gGmbH, TUD Dresden University of Technology (Author)
  • S. Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH, TUD Dresden University of Technology (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • J. Müller - , Fraunhofer Institute for Electronic Nano Systems (Author)
  • P. Polakowski - , Fraunhofer Institute for Electronic Nano Systems (Author)
  • S. Flachowsky - , Global Foundries Dresden (Author)

Details

Original languageEnglish
Title of host publication2015 Joint IEEE International Symposium on the Applications of Ferroelectric, International Symposium on Integrated Functionalities and Piezoelectric Force Microscopy Workshop, ISAF/ISIF/PFM 2015
ISBN (electronic)978-1-4799-9974-3
Publication statusPublished - 2015
Peer-reviewedYes

Publication series

SeriesIEEE International Symposium on Applications of Ferroelectrics (ISAF)
ISSN1099-4734

External IDs

Scopus 84947915838

Keywords