Nanoscopic studies of domain structure dynamics in ferroelectric La:HfO2 capacitors

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • P. Buragohain - (Author)
  • C. Richter - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Schenk - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • H. Lu - (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - (Author)
  • A. Gruverman - (Author)

Details

Original languageEnglish
Article number222901
JournalApplied physics letters
Volume112
Issue number22
Publication statusPublished - 28 May 2018
Peer-reviewedYes

External IDs

Scopus 85048265461

Keywords

Library keywords