Mechanical stress induced polarization reorientation in polycrystalline Bi3.25La0.75Ti3O12 films

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Yi Kan - , Nanjing University (Author)
  • Yunfei Liu - , Nanjing University (Author)
  • Oliver Mieth - , TUD Dresden University of Technology (Author)
  • Huifeng Bo - , Nanjing University (Author)
  • Xiumei Wu - , Southeast University, Nanjing (Author)
  • Xiaomei Lu - , Nanjing University (Author)
  • Lukas M. Eng - , Chair of Experimental Physics / Photophysics (Author)
  • Jinsong Zhu - , Nanjing University (Author)

Abstract

A wafer bending stage and a scanning probe microscope are combined to investigate the in situ domain pattern evolution in polycrystalline Bi3.25La0.75Ti3O12 films under stress. We observe the stress induced polarization reorientation that sensitively depends on the relative alignment of the BLT unit cell with respect to the stress.

Details

Original languageEnglish
Pages (from-to)360-365
Number of pages6
JournalPhysics Letters, Section A: General, Atomic and Solid State Physics
Volume374
Issue number2
Publication statusPublished - 28 Dec 2009
Peer-reviewedYes

External IDs

ORCID /0000-0002-2484-4158/work/175744064

Keywords

ASJC Scopus subject areas

Keywords

  • Dynamic domain change, Scanning probe microscope, Stress impact, Thin film ferroelectrics