Low leakage ZrO<inf>2</inf> based capacitors for sub 20 nm dynamic random access memory technology nodes

Research output: Contribution to journalResearch articleContributedpeer-review

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Details

Original languageEnglish
Article number064101
JournalJournal of applied physics
Volume119
Issue number6
Publication statusPublished - 2016
Peer-reviewedYes

External IDs

Scopus 84958559633

Keywords