Low leakage ZrO<inf>2</inf> based capacitors for sub 20 nm dynamic random access memory technology nodes
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Details
Original language | English |
---|---|
Article number | 064101 |
Journal | Journal of applied physics |
Volume | 119 |
Issue number | 6 |
Publication status | Published - 2016 |
Peer-reviewed | Yes |
External IDs
Scopus | 84958559633 |
---|