Investigating charge trapping in ferroelectric thin films through transient measurements

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Suzanne Lancaster - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Patrick D. Lomenzo - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Moritz Engl - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Bohan Xu - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Uwe Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Abstract

A measurement technique is presented to quantify the polarization loss in ferroelectric thin films as a function of delay time during the first 100s after switching. This technique can be used to investigate charge trapping in ferroelectric thin films by analyzing the magnitude and rate of polarization loss. Exemplary measurements have been performed on Hf0.5Zr0.5O2 (HZO) and HZO/Al2O3 films, as a function of pulse width and temperature. It is found that the competing effects of the depolarization field, internal bias field and charge trapping lead to a characteristic Gaussian dependence of the rate of polarization loss on the delay time. From this, a charge trapping and screening model could be identified which describes the dynamics of polarization loss on short timescales.

Details

Original languageEnglish
Article number939822
Journal Frontiers in nanotechnology
Volume4
Publication statusPublished - 17 Aug 2022
Peer-reviewedYes

External IDs

ORCID /0000-0003-3814-0378/work/142256151

Keywords

Keywords

  • charge trapping, dielectrics, electrical characterization, ferroelectrics, hafnium zirconium oxide, polarization switching, reliability, temperature dependence