Investigating charge trapping in ferroelectric thin films through transient measurements

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Suzanne Lancaster - , Technische Universität Dresden (Autor:in)
  • Patrick D. Lomenzo - , Technische Universität Dresden (Autor:in)
  • Moritz Engl - , Technische Universität Dresden (Autor:in)
  • Bohan Xu - , Technische Universität Dresden (Autor:in)
  • Thomas Mikolajick - , Professur für Nanoelektronik, Technische Universität Dresden (Autor:in)
  • Uwe Schroeder - , Technische Universität Dresden (Autor:in)
  • Stefan Slesazeck - , Technische Universität Dresden (Autor:in)

Abstract

A measurement technique is presented to quantify the polarization loss in ferroelectric thin films as a function of delay time during the first 100s after switching. This technique can be used to investigate charge trapping in ferroelectric thin films by analyzing the magnitude and rate of polarization loss. Exemplary measurements have been performed on Hf0.5Zr0.5O2 (HZO) and HZO/Al2O3 films, as a function of pulse width and temperature. It is found that the competing effects of the depolarization field, internal bias field and charge trapping lead to a characteristic Gaussian dependence of the rate of polarization loss on the delay time. From this, a charge trapping and screening model could be identified which describes the dynamics of polarization loss on short timescales.

Details

OriginalspracheEnglisch
Aufsatznummer939822
Fachzeitschrift Frontiers in nanotechnology
Jahrgang4
PublikationsstatusVeröffentlicht - 17 Aug. 2022
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/142256151

Schlagworte

Schlagwörter

  • charge trapping, dielectrics, electrical characterization, ferroelectrics, hafnium zirconium oxide, polarization switching, reliability, temperature dependence