INTEGRATION OF WET-CHEMICAL PROCESSING WITH LOW-TEMPERATURE PLASMA-ASSISTED PROCESSES FOR THE FORMATION OF DEVICE-QUALITY SI/SIO2 INTERFACES ON SI(111) SURFACES

Research output: Contribution to journal › Research article › Contributed

Contributors

  • T YASUDA - (Author)
  • CH BJORKMAN - (Author)
  • Y MA - (Author)
  • Z LU - (Author)
  • G LUCOVSKY - (Author)
  • U EMMERICHS - (Author)
  • C MEYER - (Author)
  • H Kurz - (Author)
  • Karl Leo - , Chair of Opto-Electronics, AT&T Bell Laboratories (Author)

Details

Original languageEnglish
Pages (from-to)217-222
Number of pages6
JournalMicroelectronic Engineering
Issue number2-4
Publication statusPublished - 1994
Peer-reviewedNo

External IDs

Scopus 0028480990

Keywords