INTEGRATED PROCESSING OF STACKED-GATE HETEROSTRUCTURES - PLASMA-ASSISTED LOW-TEMPERATURE PROCESSING COMBINED WITH RAPID THERMAL HIGH-TEMPERATURE PROCESSING
Research output: Contribution to journal › Research article › Contributed
Contributors
Details
Original language | English |
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Pages (from-to) | 209-214 |
Number of pages | 6 |
Journal | Microelectronic Engineering |
Issue number | 2-4 |
Publication status | Published - 1994 |
Peer-reviewed | No |
External IDs
Scopus | 0028480395 |
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