Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2based ferroelectric capacitors on reliability performance

Research output: Contribution to book/Conference proceedings/Anthology/ReportConference contributionContributedpeer-review

Contributors

Abstract

La2O3, and Al2O3, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf0.5Zr0.5O2 capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La2O3 outperforming Al2O3.

Details

Original languageEnglish
Title of host publication2022 IEEE International Memory Workshop (IMW)
Place of PublicationDresden
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Number of pages4
ISBN (electronic)978-1-6654-9947-7
ISBN (print)978-1-6654-9946-0
Publication statusPublished - 2022
Peer-reviewedYes

Publication series

SeriesIEEE International Memory Workshop (IMW)
ISSN2330-7978

Workshop

Title14th IEEE International Memory Workshop
Abbreviated titleIMW 2022
Conference number14
Duration15 - 18 March 2022
CityDresden
CountryGermany

External IDs

Mendeley db60f22d-ed2c-382f-93a8-c3bd798a003b
ORCID /0000-0003-3814-0378/work/142256160

Keywords

DFG Classification of Subject Areas according to Review Boards

Keywords

  • AlO, ferroelectric, HfZrO, interfacial oxide layer, LaO, Hf0.5Zr0.5O2, La2O3, Al2O3