Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2based ferroelectric capacitors on reliability performance
Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review
Contributors
Abstract
La2O3, and Al2O3, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf0.5Zr0.5O2 capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La2O3 outperforming Al2O3.
Details
| Original language | English |
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| Title of host publication | 2022 IEEE International Memory Workshop (IMW) |
| Place of Publication | Dresden |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Number of pages | 4 |
| ISBN (electronic) | 978-1-6654-9947-7 |
| ISBN (print) | 978-1-6654-9946-0 |
| Publication status | Published - 2022 |
| Peer-reviewed | Yes |
Publication series
| Series | IEEE International Memory Workshop (IMW) |
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| ISSN | 2330-7978 |
Workshop
| Title | 14th IEEE International Memory Workshop |
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| Abbreviated title | IMW 2022 |
| Conference number | 14 |
| Duration | 15 - 18 March 2022 |
| City | Dresden |
| Country | Germany |
External IDs
| Mendeley | db60f22d-ed2c-382f-93a8-c3bd798a003b |
|---|---|
| ORCID | /0000-0003-3814-0378/work/142256160 |
Keywords
Research priority areas of TU Dresden
DFG Classification of Subject Areas according to Review Boards
ASJC Scopus subject areas
Keywords
- AlO, ferroelectric, HfZrO, interfacial oxide layer, LaO, Hf0.5Zr0.5O2, La2O3, Al2O3