Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2based ferroelectric capacitors on reliability performance

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

Abstract

La2O3, and Al2O3, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf0.5Zr0.5O2 capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La2O3 outperforming Al2O3.

Details

OriginalspracheEnglisch
Titel2022 IEEE International Memory Workshop (IMW)
ErscheinungsortDresden
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers (IEEE)
Seitenumfang4
ISBN (elektronisch)978-1-6654-9947-7
ISBN (Print)978-1-6654-9946-0
PublikationsstatusVeröffentlicht - 2022
Peer-Review-StatusJa

Publikationsreihe

ReiheIEEE International Memory Workshop (IMW)
ISSN2330-7978

Workshop

Titel14th IEEE International Memory Workshop
KurztitelIMW 2022
Veranstaltungsnummer14
Dauer15 - 18 März 2022
StadtDresden
LandDeutschland

Externe IDs

Mendeley db60f22d-ed2c-382f-93a8-c3bd798a003b
ORCID /0000-0003-3814-0378/work/142256160