Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2based ferroelectric capacitors on reliability performance
Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/Gutachten › Beitrag in Konferenzband › Beigetragen › Begutachtung
Beitragende
Abstract
La2O3, and Al2O3, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf0.5Zr0.5O2 capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La2O3 outperforming Al2O3.
Details
| Originalsprache | Englisch |
|---|---|
| Titel | 2022 IEEE International Memory Workshop (IMW) |
| Erscheinungsort | Dresden |
| Herausgeber (Verlag) | Institute of Electrical and Electronics Engineers (IEEE) |
| Seitenumfang | 4 |
| ISBN (elektronisch) | 978-1-6654-9947-7 |
| ISBN (Print) | 978-1-6654-9946-0 |
| Publikationsstatus | Veröffentlicht - 2022 |
| Peer-Review-Status | Ja |
Publikationsreihe
| Reihe | IEEE International Memory Workshop (IMW) |
|---|---|
| ISSN | 2330-7978 |
Workshop
| Titel | 14th IEEE International Memory Workshop |
|---|---|
| Kurztitel | IMW 2022 |
| Veranstaltungsnummer | 14 |
| Dauer | 15 - 18 März 2022 |
| Stadt | Dresden |
| Land | Deutschland |
Externe IDs
| Mendeley | db60f22d-ed2c-382f-93a8-c3bd798a003b |
|---|---|
| ORCID | /0000-0003-3814-0378/work/142256160 |
Schlagworte
Forschungsprofillinien der TU Dresden
DFG-Fachsystematik nach Fachkollegium
ASJC Scopus Sachgebiete
Schlagwörter
- AlO, ferroelectric, HfZrO, interfacial oxide layer, LaO, Hf0.5Zr0.5O2, La2O3, Al2O3