Impact of scaling on the performance of HfO2-based ferroelectric field effect transistors

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • E. Yurchuk - (Author)
  • J. Muller - (Author)
  • J. Paul - (Author)
  • T. Schlosser - (Author)
  • D. Martin - (Author)
  • R. Hoffmann - (Author)
  • S. Mueller - (Author)
  • S. Slesazeck - (Author)
  • U. Schroeder - (Author)
  • R. Boschke - (Author)
  • R. Van Bentum - (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Details

Original languageEnglish
Pages (from-to)3699 - 3706
Number of pages8
JournalIEEE transactions on electron devices : ED
Volume61
Issue number11
Publication statusPublished - 17 Sept 2014
Peer-reviewedYes

External IDs

Scopus 84908452164

Keywords

Library keywords