Hybrid lithography approach for single mode polymeric waveguides and out-of-plane coupling mirrors
Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review
Contributors
Abstract
This paper describes technology and process development for a hybrid lithography approach pairing UV-lithography for planar single mode waveguides with 2-photon-polymerization direct-laser-writing for out-of-plane coupling mirrors. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV-lithography are presented. Near square core cross sections are achieved. Minimum alignment accuracy at ≈ 3 μm is observed. Cut-back measurement on single mode waveguides shows attenuation of 0.64 dB cm-1 and 1.5 dB cm-1 at 1310 nm and 1550 nm respectively. Up to 2.5-times increase of shear-strength after thermal exposure up to 300 C is found using shear tests and compared for various surface treatments. Mechanical compatibility to reflow soldering is derived. An extensive study on the pattering of ORMOCER® using 2-photon-polymerization is performed. Flat 45-micro mirrors with sub-10 μm dimensions are 3D-printed both in OrmoCore and OrmoComp. Outlook to further research on hybrid lithography integration approach is given.
Details
| Original language | English |
|---|---|
| Title of host publication | 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC) |
| Place of Publication | San Diego |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Pages | 1919-1926 |
| Number of pages | 8 |
| ISBN (electronic) | 978-1-6654-7943-1 |
| ISBN (print) | 978-1-6654-7944-8 |
| Publication status | Published - 2022 |
| Peer-reviewed | Yes |
Publication series
| Series | Electronic Components and Technology Conference (ECTC) |
|---|---|
| Volume | 2022-May |
| ISSN | 0569-5503 |
Conference
| Title | 2022 IEEE 72nd Electronic Components and Technology Conference |
|---|---|
| Abbreviated title | ECTC 2022 |
| Conference number | 72 |
| Duration | 31 May - 3 June 2022 |
| Location | The Sheraton San Diego Hotel and Marina |
| City | San Diego |
| Country | United States of America |
External IDs
| Mendeley | 6633581c-e63e-38a7-8ce1-62b9cd89fffb |
|---|---|
| ORCID | /0000-0002-0757-3325/work/139064765 |
Keywords
ASJC Scopus subject areas
Keywords
- 2-photon-polymerization direct-laser-writing, direct patterning, hybrid lithography, micro-mirrors, optical interconnects, ORMOCER®, single mode, UV-lithography