Hafnium oxide based ferroelectric devices for memories and beyond

Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review

Contributors

Details

Original languageEnglish
Title of host publication2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018
Publication statusPublished - 2018
Peer-reviewedYes

External IDs

Scopus 85050498429

Keywords