Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • C. Richter - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Schenk - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Details

Original languageEnglish
Article number01A117
Journal Journal of vacuum science & technology : JVST ; A, Vacuum, surfaces, and films
Volume32
Issue number1
Publication statusPublished - 2014
Peer-reviewedYes

External IDs

Scopus 84891812547

Keywords

Library keywords