Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • Min Hyuk Park - , Seoul National University (Author)
  • Y.H. Lee - , Seoul National University (Author)
  • H.J. Kim - , Seoul National University (Author)
  • Y.J. Kim - , Seoul National University (Author)
  • T. Moon - , Seoul National University (Author)
  • K.D. Kim - , Seoul National University (Author)
  • J. Müller - , Fraunhofer Institute for Photonic Microsystems (Author)
  • A. Kersch - , Munich University of Applied Sciences (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • C.S. Hwang - , Seoul National University (Author)

Details

Original languageEnglish
Pages (from-to)1811-1831
Number of pages21
JournalAdvanced materials
Volume27
Issue number11
Publication statusPublished - 2015
Peer-reviewedYes

External IDs

Scopus 85027947135

Keywords

Library keywords