Ferroelectric Zr(0.5)Hf(0.5)O(2) thin films for nonvolatile memory applications

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • T. S. Boscke - (Author)
  • U. Bottger - (Author)
  • D. Brauhaus - (Author)
  • L. Frey - (Author)
  • P. Kucher - (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • J. Muller - (Author)
  • U. Schroder - (Author)
  • J. Sundqvist - , Fraunhofer Institute for Photonic Microsystems (Author)

Details

Original languageEnglish
Article number112901
JournalApplied physics letters
Volume99
Issue number11
Publication statusPublished - 2011
Peer-reviewedYes

Keywords