Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memory applications

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • J. Müller - (Author)
  • T.S. Böscke - (Author)
  • D. Bräuhaus - (Author)
  • U. Schröder - (Author)
  • U. Böttger - (Author)
  • J. Sundqvist - , Fraunhofer Institute for Photonic Microsystems (Author)
  • P. Kcher - (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • L. Frey - (Author)

Details

Original languageEnglish
Article number112901
JournalApplied physics letters
Volume99
Issue number11
Publication statusPublished - 2011
Peer-reviewedYes

External IDs

ORCID /0000-0003-3814-0378/work/16668347
Scopus 80053211514

Keywords

Library keywords