Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Details

Original languageEnglish
Pages (from-to)340–346
Number of pages7
JournalMRS bulletin
Volume43
Publication statusPublished - 2018
Peer-reviewedYes

External IDs

Scopus 85047358653