Experimental proof of the drain-side dielectric breakdown of HKMG nMOSFETs under logic circuit operation

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Steve Kupke - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Steve Knebel - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Johannes Ocker - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Rimoon Agaiby - , Global Foundries, Inc. (Author)
  • Martin Trentzsch - , Global Foundries, Inc. (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Abstract

Continuous CMOS logic switching results in a consecutive series of gate bias temperature instability and drain (OFF-state) stress. We also show that the asymmetric stress condition leads to a preferential breakdown at the drain side and that neither gate-only nor drain-only stress can reproduce this behavior. The findings are verified by the voltage ratio method as well as dc current-voltage measurements and are caused by trapping and detrapping under the alternating electric field.

Details

Original languageEnglish
Article number7058394
Pages (from-to)430-432
Number of pages3
JournalIEEE electron device letters
Volume36
Issue number5
Publication statusPublished - 1 May 2015
Peer-reviewedYes

External IDs

ORCID /0000-0003-3814-0378/work/142256289

Keywords

Keywords

  • ac, BTI, CMOS, HKMG, inverter, off-state, TDDB