Experimental proof of the drain-side dielectric breakdown of HKMG nMOSFETs under logic circuit operation

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Steve Kupke - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Steve Knebel - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Johannes Ocker - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)
  • Rimoon Agaiby - , Global Foundries, Inc. (Autor:in)
  • Martin Trentzsch - , Global Foundries, Inc. (Autor:in)
  • Thomas Mikolajick - , Professur für Nanoelektronik, NaMLab - Nanoelectronic materials laboratory gGmbH (Autor:in)

Abstract

Continuous CMOS logic switching results in a consecutive series of gate bias temperature instability and drain (OFF-state) stress. We also show that the asymmetric stress condition leads to a preferential breakdown at the drain side and that neither gate-only nor drain-only stress can reproduce this behavior. The findings are verified by the voltage ratio method as well as dc current-voltage measurements and are caused by trapping and detrapping under the alternating electric field.

Details

OriginalspracheEnglisch
Aufsatznummer7058394
Seiten (von - bis)430-432
Seitenumfang3
FachzeitschriftIEEE electron device letters
Jahrgang36
Ausgabenummer5
PublikationsstatusVeröffentlicht - 1 Mai 2015
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-3814-0378/work/142256289

Schlagworte

Schlagwörter

  • ac, BTI, CMOS, HKMG, inverter, off-state, TDDB