Erratum: Ferroelectric thin films: Review of materials, properties, and applications (Journal of Applied Physics (2006) 100 (051606))

Research output: Contribution to specialist publication › Corrections (errata and retractions) › peer-review

Contributors

  • N. Setter - , Swiss Federal Institute of Technology Lausanne (EPFL) (Author)
  • D. Damjanovic - , Swiss Federal Institute of Technology Lausanne (EPFL) (Author)
  • L. Eng - , Chair of Experimental Physics / Photophysics (Author)
  • G. Fox - , Ramtron Int. Corp. (Author)
  • S. Gevorgian - , Chalmers University of Technology, Ericsson AB (Author)
  • S. Hong - , Samsung (Author)
  • A. Kingon - , North Carolina State University (Author)
  • H. Kohlstedt - , Jülich Research Centre, University of California at Berkeley (Author)
  • N. Y. Park - , Samsung (Author)
  • G. B. Stephenson - , Argonne National Laboratory (Author)
  • I. Stolitchnov - , Swiss Federal Institute of Technology Lausanne (EPFL) (Author)
  • A. K. Taganstev - , Swiss Federal Institute of Technology Lausanne (EPFL) (Author)
  • D. V. Taylor - , Swiss Federal Institute of Technology Lausanne (EPFL), Nanosys Inc. (Author)
  • T. Yamada - , Swiss Federal Institute of Technology Lausanne (EPFL) (Author)
  • S. Streiffer - , Argonne National Laboratory (Author)

Details

Original languageEnglish
Volume100
Issue number10
JournalJournal of applied physics
Publication statusPublished - 2006
Peer-reviewedYes
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Keywords

ASJC Scopus subject areas