Electrical stress on film resistive structures on different substrates

Research output: Contribution to book/conference proceedings/anthology/reportConference contributionContributedpeer-review

Contributors

  • Detlef Bonfert - , Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT) (Author)
  • Gerhard Klink - , Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT) (Author)
  • Karlheinz Bock - , Chair of Electronic Packaging Technology, Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT), Technical University of Munich (Author)
  • Paul Svasta - , Polytechnic University of Bucharest (Author)
  • Ciprian Ionescu - , Polytechnic University of Bucharest (Author)

Abstract

One of the most important issues of resistors properties is the value stability under different electrical and non electrical influences. Mechanical and/or thermal stress together with the electrical one represent the main factors that have a major contribution in resistor value stability. With highly isolating and/or flexible substrates the devices become also susceptible to electrical stress, like for example Electro Static Discharge (ESD). In order to investigate the behavior at high current densities, a pulsed measurement technique was applied to the film resistive structures on different substrates. The analytical test technique of Transmission Line Pulsers (TLP) allows, on the basis of square pulses, the in-situ monitoring of the voltages and currents at the Device Under Test (DUT) during pulsing and helps to gain fundamental insights into the electrical behavior at higher current densities. In this work the analysis is made comparing thick- and thin- film resistors on different, rigid and flexible substrates, with single and multiple pulsing, showing the common behavior before, during and after pulsing.

Details

Original languageGerman
Title of host publicationProceedings of the 2011 34th International Spring Seminar on Electronics Technology (ISSE)
PublisherIEEE
Pages307-312
Number of pages6
ISBN (print)978-1-4577-2110-6
Publication statusPublished - 15 May 2011
Peer-reviewedYes

Conference

Title2011 34th International Spring Seminar on Electronics Technology
SubtitleNew Trends in Micro/Nanotechnology
Abbreviated titleISSE 2011
Conference number34
Duration11 - 15 May 2011
LocationHigh Tatras resort
CityTratanska Lomnica
CountrySlovakia

External IDs

Scopus 83055195315
ORCID /0000-0002-0757-3325/work/139064842

Keywords

Keywords

  • Resistance, Resistors, Electrical resistance measurement, Voltage measurement, Pulse measurements, Semiconductor device measurement, Thick films