Electrical stress on film resistive structures on different substrates

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • Detlef Bonfert - , Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT) (Autor:in)
  • Gerhard Klink - , Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT) (Autor:in)
  • Karlheinz Bock - , Professur für Aufbau- und Verbindungstechnik der Elektronik, Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT), Technische Universität München (Autor:in)
  • Paul Svasta - , University Politehnica of Bucharest (Autor:in)
  • Ciprian Ionescu - , University Politehnica of Bucharest (Autor:in)

Abstract

One of the most important issues of resistors properties is the value stability under different electrical and non electrical influences. Mechanical and/or thermal stress together with the electrical one represent the main factors that have a major contribution in resistor value stability. With highly isolating and/or flexible substrates the devices become also susceptible to electrical stress, like for example Electro Static Discharge (ESD). In order to investigate the behavior at high current densities, a pulsed measurement technique was applied to the film resistive structures on different substrates. The analytical test technique of Transmission Line Pulsers (TLP) allows, on the basis of square pulses, the in-situ monitoring of the voltages and currents at the Device Under Test (DUT) during pulsing and helps to gain fundamental insights into the electrical behavior at higher current densities. In this work the analysis is made comparing thick- and thin- film resistors on different, rigid and flexible substrates, with single and multiple pulsing, showing the common behavior before, during and after pulsing.

Details

OriginalspracheDeutsch
TitelProceedings of the 2011 34th International Spring Seminar on Electronics Technology (ISSE)
Herausgeber (Verlag)IEEE
Seiten307-312
Seitenumfang6
ISBN (Print)978-1-4577-2110-6
PublikationsstatusVeröffentlicht - 15 Mai 2011
Peer-Review-StatusJa

Konferenz

Titel2011 34th International Spring Seminar on Electronics Technology
UntertitelNew Trends in Micro/Nanotechnology
KurztitelISSE 2011
Veranstaltungsnummer34
Dauer11 - 15 Mai 2011
OrtHigh Tatras resort
StadtTratanska Lomnica
LandSlowakei

Externe IDs

Scopus 83055195315
ORCID /0000-0002-0757-3325/work/139064842

Schlagworte

Schlagwörter

  • Resistance, Resistors, Electrical resistance measurement, Voltage measurement, Pulse measurements, Semiconductor device measurement, Thick films