Effect of independently sized gates on the delay of reconfigurable silicon nanowire transistor based circuits
Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review
Contributors
Abstract
Reconfigurable silicon nanowire field effect transistors (RFETs) provide both operation modes of p-type and n-type field effect transistors in a single multigate device. This unique feature provides additional degrees of freedom in terms of circuit design and device layout. Here a device-circuit co-design study of a novel 1-bit full adder with only 20 transistors is presented. The delay of the adder is analyzed using the logical effort theory and compared to standard CMOS implementation. The effect of independent gate sizing on device and circuit characteristics will be discussed. It will be shown that asymmetric gates can be exploited to reduce the critical delay of the new adder by 15 %, although the individual device performance is kept constant.
Details
| Original language | English |
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| Title of host publication | EUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Pages | 17-20 |
| Number of pages | 4 |
| ISBN (electronic) | 9781479969111 |
| Publication status | Published - 18 Mar 2015 |
| Peer-reviewed | Yes |
Publication series
| Series | International Conference on Ultimate Integration of Silicon, ULIS |
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Conference
| Title | 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015 |
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| Duration | 26 - 28 January 2015 |
| City | Bologna |
| Country | Italy |
External IDs
| ORCID | /0000-0003-3814-0378/work/142256290 |
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Keywords
ASJC Scopus subject areas
Keywords
- device-circuit co-design, functional enhanced devices, logic gates, logical effort, multigate, polarity control, reconfigurable transistor, RFET, Schottky barrier, Schottky field effect transistor, silicon nanowires