Effect of independently sized gates on the delay of reconfigurable silicon nanowire transistor based circuits

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

Abstract

Reconfigurable silicon nanowire field effect transistors (RFETs) provide both operation modes of p-type and n-type field effect transistors in a single multigate device. This unique feature provides additional degrees of freedom in terms of circuit design and device layout. Here a device-circuit co-design study of a novel 1-bit full adder with only 20 transistors is presented. The delay of the adder is analyzed using the logical effort theory and compared to standard CMOS implementation. The effect of independent gate sizing on device and circuit characteristics will be discussed. It will be shown that asymmetric gates can be exploited to reduce the critical delay of the new adder by 15 %, although the individual device performance is kept constant.

Details

OriginalspracheEnglisch
TitelEUROSOI-ULIS 2015 - 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers Inc.
Seiten17-20
Seitenumfang4
ISBN (elektronisch)9781479969111
PublikationsstatusVeröffentlicht - 18 März 2015
Peer-Review-StatusJa

Publikationsreihe

ReiheInternational Conference on Ultimate Integration of Silicon, ULIS

Konferenz

Titel2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2015
Dauer26 - 28 Januar 2015
StadtBologna
LandItalien

Externe IDs

ORCID /0000-0003-3814-0378/work/142256290

Schlagworte

ASJC Scopus Sachgebiete

Schlagwörter

  • device-circuit co-design, functional enhanced devices, logic gates, logical effort, multigate, polarity control, reconfigurable transistor, RFET, Schottky barrier, Schottky field effect transistor, silicon nanowires